采用溶胶-凝胶旋涂法在石英衬底上制备了不同Mg,Sn掺杂比例的ZnO薄膜,研究了不同Mg,Sn比例对ZnO薄膜微观结构、表面形貌和光电性能的影响及其内在机制.结果表明:Mg,Sn掺杂后薄膜仍保持六方纤锌矿结构并沿(002)方向择优生长,掺入2%的Mg后,晶粒有所长大,保持2% Mg不变,随着Sn的掺入,薄膜晶粒减小,但薄膜的致密度、表面平整度以及薄膜晶粒均匀性却有明显的改善;适量Mg,Sn掺杂,一方面,因Mg,Zn离子的金属性差异和Sn4+替位Zn2+晶格位置提供两个自由电子使薄膜载流子浓度增加产生Burstein-Moss效应,另一方面,因晶粒尺寸变小产生量子限域效应,薄膜禁带宽度增大,同时可见光透过率也有着明显提高;Mg,Sn共掺杂使薄膜结晶变好,载流子迁移率增大,同时载流子浓度上升,ZnO薄膜电阻率呈现较大幅度的下降.
参考文献
[1] | 徐游,李风,曾国勋.二元掺杂对SnO2薄膜的结构与光学性能的影响[J].人工晶体学报,2013(05):886-890. |
[2] | Gong, L;Ye, ZZ;Lu, JG;Zhu, LP;Huang, JY;Gu, XQ;Zhao, BH .Highly transparent conductive and near-infrared reflective ZnO:Al thin films[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2010(7):947-952. |
[3] | J. J. Berry;D. S. Ginley;P. E. Burrows .Organic light emitting diodes using a Ga:ZnO anode[J].Applied physics letters,2008(19):193304-1-193304-3-0. |
[4] | 刘暐昌 .ZnO基薄膜和器件的制备及性能研究[D].浙江大学,2008. |
[5] | 钟志有,张腾,顾锦华,孙奉娄.磁控溅射沉积掺锡氧化铟透明导电薄膜的光电性能研究[J].人工晶体学报,2013(04):647-652,670. |
[6] | 吴克跃,吴兴举,常磊.衬底温度对Al掺杂ZnO薄膜结构及其光电性能的影响[J].人工晶体学报,2013(10):2156-2159,2169. |
[7] | Ma J.;Hao XT.;Ma HL.;Xu XG.;Yang YG.;Huan SL.;Zhang DH.;Cheng CF. .RF magnetron sputtering SnO2 : Sb films deposited on organic substrates[J].Solid State Communications,2002(6/7):345-349. |
[8] | 马瑾,黄树来,计峰,余旭浒,王玉恒,马洪磊.Zn-Sn-O透明导电膜的制备和光电性质[J].稀有金属,2004(03):519-521. |
[9] | W. I. Park;Gyu-Chul Yi;H. M. Jang .Metalorganic vapor-phase epitaxial growth and photoluminescent properties of Zn_(1-x)Mg_(x)O(0≤x≤0.49) thin films[J].Applied physics letters,2001(13):2022-2024. |
[10] | 邱东江,吴惠桢,陈奶波,田维坚.Si(111)衬底上生长的立方MgxZn1-xO晶体薄膜[J].无机材料学报,2003(06):1385-1388. |
[11] | 高立,张建民.带隙可调的Al,Mg掺杂ZnO薄膜的制备[J].物理学报,2009(10):7199-7203. |
[12] | Agashe C.;Kluth O.;Schope G.;Siekmann H.;Hupkes J.;Rech B. .Optimization of the electrical properties of magnetron sputtered aluminum-doped zinc oxide films for opto-electronic applications[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):167-172. |
[13] | 袁海,刘正堂.原子层沉积Sn掺杂ZnO薄膜结构及光电性能的研究[J].人工晶体学报,2013(02):240-245. |
[14] | Girtan M.;Folcher G. .Structural and optical properties of indium oxide thin films prepared by an ultrasonic spray CVD process[J].Surface & Coatings Technology,2003(2/3):242-250. |
[15] | 靳锡联,娄世云,孔德国,李蕴才,杜祖亮.Mg掺杂ZnO所致的禁带宽度增大现象研究[J].物理学报,2006(09):4809-4815. |
[16] | 巩锋 .溶胶凝胶法制备Al<'3+>:ZnO薄膜及其性能研究[D].北京工业大学,2003. |
[17] | Chang Eun Kim;Pyung Moon;Sungyeon Kim;Jae-Min Myoung;Hyeon Woo Jang;Jungsik Bang;Ilgu Yun .Effect of carrier concentration on optical bandgap shift in ZnO:Ga thin films[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2010(22):6304-6307. |
[18] | Vrushali Shelke;B. K. Sonawane;M. P. Bhole;D. S. Patil .Electrical and optical properties of transparent conducting tin doped ZnO thin films[J].Journal of Materials Science. Materials in Electronics,2012(2):451-456. |
[19] | Young-Sung Kim;Weon-Pil Tai .Electrical and optical properties of Al-doped ZnO thin films by sol-gel process[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(11):4911-4916. |
[20] | 刘凯,赵小如,赵亮,姜亚军,南瑞华,魏炳波.pH值对溶胶-凝胶法制备的掺铝氧化锌薄膜光电性能的影响[J].人工晶体学报,2009(03):585-590,596. |
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