采用磁控溅射法,以Al/Er合金为靶材,在Si衬底上制备出AlN: Er薄膜.XRD分析结果表明样品为非晶态.XPS分析结果表明,制备的AlN具有良好的化学计量比,Er的含量为1 at%左右,氧很难避免,含量约为10%.光致发光光谱的测试表明,样品的PL光谱呈现宽谱之上叠加尖峰谱的特征,其中,尖荧光峰谱源于Er~(3+)的4f轨道直接激发跃迁,而宽谱则与Er~(3+)的4f轨道的间接激发跃迁和O杂质有关.
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