采用微波增强的反应磁控溅射和离子注入法以及两者相结合的工艺制备了TaN系薄膜.通过X射线衍射(XRD)分析了薄膜的晶体结构,用微磨损仪和白光轮廓仪对样品的摩擦系数和磨损情况进行了检测和分析.结果表明,Ta离子注入与TaN沉积相结合的方式制备的薄膜耐磨损性能较好,其中Ta离子注入后沉积的Ta/TaN多层膜耐磨性能最好.说明此种工艺有效整合了两种工艺的优点,有利于薄膜力学性能的改善.
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