ＺｎＯ薄膜是一种具有优良的压电、光电、气敏、压敏等性质的材料，在透明导体、发光元件、太阳能电池窗口材料、光波导器、单色场发射显示器材料、高频压电转换器、表面声波元件、微传感器以及低压压敏电阻器等方面具有广泛的用途．ＺｎＯ 薄膜的制备方法多样，各具优缺点；而薄膜性质的差异则取决于不同的掺杂组分，并与制备工艺紧密相关．本文综述了ＺｎＯ薄膜的制备及性质特征，并对其发展趋势及前景进行了探讨．
ZnO thin films are the materials with many excellent properties such as piezoeletricity, conductivity,
optical absorption and emission, gas-sensitivity, and highly nonlinear voltage-current characteristics. They have a wide variety of applications
such as transparent conductors, luminescence diode, window materials for solar cells, optical wave guides, phosphor for monochrome field emission
displays, piezoelectric transducers in the GHz range, surface acoustic wave devices, micro-sensors and micro-actuators, and low-voltage varistors.
There are many methods for the preparation of ZnO thin films, and each has its advantages and disadvantages. The properties of ZnO thin films depend on the dopants and the preparation conditions. This paper reviews the
preparations and properties of ZnO thin films, and discusses their development prospects.
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