Research of the Effects of Electron Focused Electric Field upon an Enhanced Glow Discharge Plasma Ion Implantation

材料保护, 2004, 37(z2): 141-143.

^1, , ^2, , ^3, , ^4, , ^5,

1.School of Mechanical Engineering and Automation , Beijing University of Aeronautics and Astronautics. Beijing, 100083; School of Materials Science and Technology, Shanghai Jiao Tong University,Shanghai 200240 P. R. China

2.School of Mechanical Engineering and Automation , Beijing University of Aeronautics and Astronautics. Beijing, 100083

3.School of Mechanical Engineering and Automation , Beijing University of Aeronautics and Astronautics. Beijing, 100083

4.School of Materials Science and Technology, Shanghai Jiao Tong University,Shanghai 200240 P. R. China

5.Dept. of Physics & Materials Science, City University of Hong Kong,Kowloon, Hong Kong

基金项目: City University of Hong Kong SRG(7001389) Germany / Hong Kong RGC Joint Research Scheme G_HK001/02(CityU designation 9050165) This work was jointly supported by National Natural Science Foundation of China(50271004)

Research of the Effects of Electron Focused Electric Field upon an Enhanced Glow Discharge Plasma Ion Implantation

Keywords： PBII

A new Enhanced Glow Discharge Plasma Ion Implantation methods are introduced, in which the plasma are produced by the self glow discharge excitated by high negative voltage bias. The electric field is designed to a electron focusing mode by using a small area hollow anode and a large area sample holder cathode. The pattern of equipotentials of the electric field are calculated through finite-element method. By using the special electron-focusing field, the self glow discharge are enhanced and provide denser ions to implanted into the substrate.

参考文献

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Research of the Effects of Electron Focused Electric Field upon an Enhanced Glow Discharge Plasma Ion Implantation

参考文献