磁过滤对多弧离子镀(TiAl)N薄膜的影响

中国有色金属学报, 2001, 11(z1): 179-182.

磁过滤对多弧离子镀(TiAl)N薄膜的影响

李成明 ^1, , 张勇 ^2, , 曹尔妍 ^3, , 薛明伦 ^4,

1.中国科学院力学研究所,

2.中国科学院力学研究所,

3.中国科学院力学研究所,

4.中国科学院力学研究所,

关键词：过滤电弧 , 薄膜 , 宏观颗粒 , 抗氧化性能

Deposition and properties of high quality (TiAl)N hard coatings

介绍了利用过滤电弧离子镀沉积(TiAl)N薄膜初步的研究结果. 在电弧靶材前沿的磁场作用下, 有效减小了薄膜的宏观颗粒尺寸, 并极大地降低了颗粒密度. 同时, 过滤电弧的作用, 使偏压对膜成分的影响减弱, 薄膜的硬度随膜中铝含量的增加而提高, (TiAl)N的抗氧化能力明显提高.

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