采用程序升温还原、氮吸附、原位X射线衍射、扫描电镜和透射电镜等方法研究了不同还原气氛对钴锆共沉淀催化剂结构的影响,并考察了催化剂上费托合成反应的性能. 结果表明, H2还原对催化剂的破坏程度较小,活性相主要是面心立方钴;CO还原导致催化剂发生积碳,催化剂中出现面心立方钴和六方钴的混晶;合成气还原使催化剂烧结严重,单质钴以面心立方和六方两种晶相存在. 费托合成反应结果表明, CO还原后催化剂没有催化性能, H2还原与合成气还原后催化剂的催化活性相差不大,但前者CH4选择性较低.
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