采用真空蒸发沉积技术在ITO玻璃上制备得到CdZnTe纳米晶薄膜,并利用台阶仪、X射线能谱仪(EDS)、X射线衍射仪(XRD)和原子力显微镜(AFM)研究了CdZnTe薄膜厚度、成分、结构和形貌特征.实验结果表明,薄膜在(111)面表现出明显的择优生长特性.在薄膜生长初期,纳米薄膜中存在一定程度的非晶态富集Te,但随着沉积时间延长,薄膜成分向化学计量比逼近,结构也向闪锌矿CdZnTe转变.薄膜表面形貌平整,粗糙度R_a约为2～5nm.随着沉积时间的延长,薄膜形貌由晶粒堆砌状向多晶层片连接状转变.在沉积时间分别为15、30和45min时,薄膜的厚度依次分别约为100、300和500nm,而薄膜的晶粒平均尺寸依次分别为43.15、30.81和71.94nm.
Nano-crystalline CdZnTe films were grown on ITO glass by vacuum deposition method.The thickness,composition,surface morphology and structure were studied by the step profiler,the X-ray photoelectron spectroscopy (EDS),X-ray diffraction (XRD),atomic force microscope (AFM).The results showed that the films possess a preferable growth surface of (111).The films are rich in amorphous Te at the beginning of the growth,but tend to the stechiometric composition of zinc blend structure of CdZnTe crystal.The surface roughness (R_a) of the films was 2-5 nano-meters.With the increase of the time,the individual grains tend to form continues multi-grain layer.For the deposition time of 15,30 and 45min,the thickness of the film as measured to be 100,300 and 400nm,and the average size of the gain are 43.15,30.81 and 71.94nm respectively.
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