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向TiAlN薄膜中添加V可改善薄膜性能.采用磁控溅射技术沉积了不同V含量的TiAlVN薄膜,通过能谱仪、台阶仪、X射线衍射仪(XRD)和原子力显微镜(AFM)分析薄膜的成分、厚度、相结构和表面形貌,用动电位极化的方法研究薄膜的抗腐蚀性能.结果表明:TiAlVN薄膜属于面心立方(fcc)和六方密排(hcp)二重结构,晶格常量比TiAlN薄膜小,晶粒尺寸比TiAlN薄膜大,含V 10.20%的TiAlVN薄膜质量相对较好;TiAlVN薄膜的腐蚀电流明显小于TiAIN薄膜,抗腐蚀性能增强,含V 10.20%的TiAlVN薄膜的抗腐蚀性能约为TiAlN薄膜的4倍.

参考文献

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