研制了一种可用于氧化铟锡(ITO)透明电极的刻蚀液,研究了其刻蚀效果,并推断刻蚀机理.选用不同pH值的FeCl3水溶液作为刻蚀功能成分,将PEG10000作为介质,以气相SiO2为触变剂制备刻蚀液,用丝网印刷法对ITO电极进行刻蚀实验,研究了不同刻蚀条件对刻蚀效果及ITO电极体积电阻率的影响.结果表明,pH值为1.67时,于80℃,90 min后ITO薄膜的刻蚀效果最优.通过EDS表征ITO电极元素的变化,用原子力显微镜(AFM)观察电极微观形貌的变化.
参考文献
| [1] | 袭著有,许启明,赵鹏等.ITO薄膜特性及发展方向[J].西安建筑科技大学学报,2004,36(1):109 |
| [2] | Antonietta D S,Kambulakwao C,Oleg S,et al.ITO-free inverted polymer solar cells with ZnO:Al cathodes and stable top anodes[J].Solar Energy Mater.Solar Cells,2012,98:52 |
| [3] | Lee Y J,Bae J W,Han H R,et al.Dry etching characteristics ofITO thin films deposited on plastic substrates[J].Thin Solid Films,2001,383:281 |
| [4] | Hsuan T T,Yung F W.Wet etching mechanisms of ITO films in oxalic acid[J].Microelectr.Eng.,2006,83:536 |
| [5] | Folcher G,Cachet H,Froment M,et al.Anodic corrosion of indium tin oxide films induced by the electrochemical oxidation of chlorides[J].Thin Solid Films,1997,301:242 |
| [6] | Huang C,Su Y K,Wu S L.The effect of solvent on the etching of ITO electrode[J].Mater.Chem.Phys.,2004,84:146 |
| [7] | Senthilkumar M,Mathiyarasu J,Joseph J,et al.Electrochemical in stability of indium tin oxide (ITO) glass in acidic pH range during cathodic polarization[J].Mater.Chem.Phys.,2008,108:403 |
| [8] | Zheng K L,Chu J R,Lu J,et al.Study on wet-etching of PZT thin films[J].Piezoelectr.Acoust.,,2005,27:209 |
| [9] | 李海玲,王文静,周春兰等.在HNO3/HF混合液中反应副产物对腐蚀特性的影响[J]太阳能学报,2010,31(9):1150 |
| [10] | 邓博,蒋益明,郝允卫等.F-和Cl对316不锈钢临界点蚀温度的协同作用[J].中国腐蚀与防护学报,2008,28(1):30 |
| [11] | 廖家兴,蒋益明,吴玮巍等.含Cl溶液中SO42对316不锈钢临界点蚀温度的影响[J].金属学报,2006,42(11):1187 |
| [12] | 吴玮巍,蒋益明,廖家兴等.Cl离子对304、316不锈钢临界点蚀温度的影响[J].腐蚀科学与防护技术,2007,19(1):16 |
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