用脉冲偏压电弧离子镀设备在保持脉冲偏压一致和工作气压恒定的条件下, 控制不同氮流量 在硬质合金基体上制备了不同氮含量的CNx薄膜. 用SEM, GIXRD, XPS, 激光Raman谱和纳米压 入等方法分别研究了薄膜的表面形貌、成分、结构与性能. 结果表明, 随着氮流量的增加, 薄膜中氮 含量先是线性增加然后趋于平缓, 薄膜呈非晶结构且为类金刚石薄膜, 其硬度与弹性模量随着氮含量 增加先增加后下降, 在x=0.081时出现最大值, 分别为32.1 GPa和411.8 GPa. 分析表明, 通过氮含量 的改变而使sp3键含量发生改变是影响薄膜性能变化的重要因素.
The uniform、smooth and dense CNx fllms with different nitrogen content were deposited on cemented carbide substrate at different nitrogen flow rate by pulsed bias arc ion plating. The surface morphology、composition、structure、hardness and elastic modulus of CNx films were investigated by Scanning electron microscopy(SEM), Glancing incidence X-ray diffraction(GIXRD), X-ray photoelectron spectroscopy(XPS)、Raman spectra and Nano-indentation, respectively. The result show that the nitrogen content in the CNx films increase linearly and then slowly with the nitrogen flow rate increasing. The X-ray diffraction result indicates that the deposited films were amorphous. The hardness and elastic modulus increase and then decrease with nitrogen content increasing. The hardness and elastic modulus of the films with the nitrogen content of 8.1(at)% has a maximum value of 32.1GPa and 411.8GPa, respectively. The Raman spectra results suggest that the deposited films have the typical characteristic of diamond-like carbon films. The ID/IG ratio decrease and then increase with increasing nitrogen content and the minimum value, which corresponds to the highest sp3 content, was obtained at nitrogen content of 8.1%. The change of sp3 content by adjusting the nitrogen content in the CNx films is the only factor that influence the hardness of the films.
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