非平衡磁控溅射技术的关键就是设计非平衡磁控溅射靶的靶面磁场分布.改善靶面横向磁场分布的均匀性是提高靶材利用率的有效途径.通过磁场的有限元分析,得到了圆型平面非平衡磁控溅射靶结构参数对靶面磁场均匀性和强度的影响,给出了非平衡磁控溅射靶的优化设计结构,并与实验结果进行了对比分析,靶面磁场强度和分布均匀性得以明显改善.
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