采用直流溅射方法制备了厚度小于0.1μm的NiOx薄膜,研究薄膜的加热氧化及其光电特性,测量了它们的透射光谱和电阻率随薄膜中的氧含量及热处理温度的变化
The thin films of NiOx, which thickness smaller than 0.1μm,were prepared by reactive sputtering of a Ni target with a mixed gas of argon and oxygen. The samples then were heated in air. It was found that the transmissivity and conductivity of the samples
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