根据热丝化学气相沉积(HFCVD)金刚石薄膜的几何特点和工艺参数, 建立了该系统的二维温度场、速度场和密度场的耦合模型。利用该模型对沉积大面积金刚石薄膜的空间场进行了模拟计算, 研究了沉积参数对空间场的影响。结果表明, 衬底处的温度分布和质量流密度的计算值与实测值相吻合。只有气体进口速度对质量流密度的均匀性影响最大, 其它沉积参数对衬底温度的均匀性、质量流密度的均匀性影响不大。 从热丝阵列的最低温度出发, 优选出沉积100 mm×100 mm、高质量金刚石薄膜比较适宜的热丝几何参数。
Two--dimension coupled model of the temperature filed, velocity field and density field was developed according to the geometry and technology parameters in hot filament chemical vapor deposition (HFCVD) diamond film. The spacial field during large area diamond film deposition was simulated using this model to study the influence of deposited parameters. The calculated results about the temperature and the mass flow density on the substrate are consistent with experimented ones. The inlet gas velocity obviously affects the uniformity of the mass flow density, and the other deposited parameters have little influence on the distributions of the temperature and mass flow density. The optimal hot filament geometry parameters to deposit high quality diamond films with an area of 100mmx100 mm are gained on the basis of the minimum temperature along hot filament array.
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