以细小的氧化铝为热喷涂粉末,采用低压等离子喷涂制备了沉积率高于50%,孔隙率低于2%的氧化铝涂层.研究了不同工艺下低压等离子喷涂氧化铝涂层的沉积率、相组成和显微结构,并对低压等离子功率和真空室压力工艺参数对涂层的影响进行了分析.研究结果表明,所制备的涂层以α-Al2O3和γ-Al2O3相并存;随着功率和压力提高,涂层的孔隙率有明显的降低,但压力达到23.7kPa时功率影响较小.此外,还对等离子焰流中的粒子温度和速度进行了计算.结果表明,在23.7kPa压力下保证粒子充分熔融的前提下使粒子具有较高的运动速度.
参考文献
| [1] | Schneider J M,Sproul W D,Voevodn A A,et al.Journal of Vacuum Science Technology,1997,15A (3):1084-1088. |
| [2] | Yan D R,He J N,Wu J J,et al.Surface and Coatings Technology,1997,89 (123):191-195. |
| [3] | Cremer R,Witthaut M,Neuschutz D,et al.Surface and Coating Technology,1999,120-121:213-218. |
| [4] | Zhu S,Wang F,Lou H,et al.Surface and Coating Technology,1995,71 (1):9-15. |
| [5] | 张罡,武颖娜,梁勇,等.稀有金属材料与工程,2003,32 (9):756-760. |
| [6] | Wang H L,Lin C H,Hona M.Thin Solid Films,1997,310 (1-2):260-264. |
| [7] | 戴达煌,周克崧,袁镇海.现代材料表面技术科学.北京:冶金工业出版社,2004:143. |
| [8] | Mobarra R,Jafaria A H,Karaminezhaa M.Surface and Coatings Technology,2006,201 (6):2202-2207. |
| [9] | Gualtieri M L,Prudenziati M,Gualtieri A F.Surface and Coatings Technology,2006,201 (6):2984-2989. |
| [10] | Wang M,Shaw L L.Surface and Coating Technology,2007,202 (1):34-44. |
| [11] | Shaw L L,Gobermana D,Rena,et al.Surface and Coatings Technology,2000,30 (1):1-8. |
| [12] | Young E J,Mateeva E,Moore J J.Thin Solid Films,2000,377-378 (1):788-792. |
| [13] | Hiroshi Takigawa,Mitsuji Hirata,Masamichi Koga.Surface and Coatings Technology,1989,39-40 (1):127-134. |
| [14] | Refke A,Barbezat G,Dorier J,et al.ITSC 2003:International Thermal Spray Conference 2003:Advancing the Science and Applying the Technology; Orlando; USA; 5-8 May,2003:581-588. |
| [15] | Zahir S,Guessasma,Gougeon P,et al.Aerospace Science and Technology,2005,9 (3):203-209. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%