为了了解水平温度梯度作用时Czochralski(CZ)结构浅池内硅熔体热毛细对流的转变滞后特性,利用有限差分法进行了非稳态三维数值模拟,坩埚外壁被加热,半径为50 mm,晶体半径为15 mm,液池深度为3 mm,坩埚外壁与晶体生长界面温差变化范围为6～27 K.模拟结果表明,当逐渐增加温差时,在△T=9 K处,二维轴对称流动转变为三维稳态流动,在△T=20.6 K处,三维稳态流动转变为三维振荡流动;当逐渐减小温差时,在△T=19.5 K处,三维振荡流动才转变为三维稳态流动,因此,二次流动转变存在滞后,滞后温差约为1.1 K.
参考文献
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