利用非平衡磁控溅射离子镀技术于不同磁控管非平衡度和磁场闭合状态下在单晶硅基体上制备出Cr镀层,采用扫描电子显微镜、X射线衍射仪分析了不同生长阶段Cr镀层的微观形貌、表面粗糙度和晶体择优牛长趋势的变化.结果表明:磁控管非平衡和磁场闭合状态的改变显著影响着Cr镀层生长过程中的结晶取向、表面粗糙度和致密度.不同非平衡度下,Cr镀层组织为疏松的柱状晶体组织,镀层表面粗糙度随磁控管非衡度的增大而增大.随着磁场闭合程度的增加,Cr镀层组织由疏松的柱状晶体组织,向较致密的柱状晶体再向致密的无明显柱状晶体的组织转化,镀层晶体有沿低能量(110)晶面生长向高能量(200)晶面过渡择优生长的趋势.
参考文献
| [1] | 戴达熀;周克崧;袁镇海.现代材料表面技术科学[M].北京:冶金工业出版社,2004:422-431. |
| [2] | 唐伟忠.镀层材料制备原理、技术及应用[M].北京:冶金工业出版社,2007:213. |
| [3] | 徐万劲.磁控溅射技术进展及应用（上）[J].现代仪器,2005(05):1-5. |
| [4] | 吴自勤;王兵.镀层生长[M].北京:科学出版社,2001:329-332. |
| [5] | P. J. Kelly;R. D. Arnell .Magnetron sputtering: a review of recent developments and applications[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2000(3):159-172. |
| [6] | Musil J. .Recent advances in magnetron sputtering technology[J].Surface & Coatings Technology,1998(1/3):280-286. |
| [7] | 白力静,张国君,蒋百灵.偏压对CrTiAlN镀层组织形貌及磨损性能的影响[J].材料热处理学报,2006(05):100-103. |
| [8] | Youn J. Kim;Ho Y. Lee;Yong M. Kim;Kyung S. Shin;Woo S. Jung;Jeon G. Han .Structure and mechanical properties of ZrCrAlN nanostructured thin films by closed-field unbalanced magnetron sputtering[J].Surface & Coatings Technology,2007(9/11):5547-5551. |
| [9] | Chambers MD;Clarke DR .Effect of long term, high temperature aging on luminescence from Eu-doped YSZ thermal barrier coatings[J].Surface & Coatings Technology,2006(7):3942-3946. |
| [10] | 钟彬,苟伟,李国卿,胡远荣.氮气含量对CrNx薄膜相结构及摩擦磨损性能的影响[J].材料热处理学报,2007(03):134-137,144. |
| [11] | Nminen L;Kuroen A;Kaski K .Kinetic Monte Carlo simulation of nucleation on patterned substrates[J].Physical Review B,2000,63:1-7. |
| [12] | Bruschi P;Nannini A;Pitto M .Three-dimensional Monte Carlo simulations of electron migration in polycrystalline thin films[J].Computational Materials Science,2000,17:299-304. |
| [13] | G. H. Gilmer;Hanchen Huang;Christopher Roland .Thin film deposition: fundamentals and modeling[J].Computational Materials Science,1998(4):354-380. |
| [14] | 张雅婷,徐章程,李菲晖.Si基上电沉积Cu薄膜的形貌与择优取向[J].人工晶体学报,2006(04):728-731. |
| [15] | Mews T;Ricjart M;Mougin A et al.Comparative study of the epitalxial growth of Cu on MgO(001) and on hydrongen terminated Si(001)[J].Surface Science,2001,481:87-96. |
| [16] | Svadkovski IV.;Golosov DA.;Zavatskly SM. .Characterisation parameters for unbalanced magnetron sputtering systems[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2002(4):283-290. |
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