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采用化学气相沉积法(CVD),在溅射了镍薄膜的硅基底上制备了定向碳纳米管薄膜.对镍薄膜的氨气预处理过程及其机理进行了研究.结果发现预处理后的岛状区域随着薄膜厚度的增加而增加,纳米粒子区域的变化则与之相反.对5nm的镍薄膜进行预处理能获得细化和均匀分布的纳米粒子,有利于定向碳纳米管的生长.碳纳米管的生长过程及其细微结构与温度有很大关系.碳源的分解、碳原子在催化剂内部的扩散以及催化剂粒子的团聚三者之间的竞争决定了碳纳米管的生长情况.本文分析了碳纳米管的顶部生长模式及该模式下催化剂粒子的形态变化.

Aligned carbon nanotubes(CNTs)have been prepared using chemical vapor deposition(CVD)method on Ni-coated silicon substrates.The NH3 treatment of Ni films and its mechanism were investigated.It reveals that the amounts of island regions increase with the rising of Ni film thickness,but at the same time,the amounts of nanoparticles decrease.Pretreatment of Ni film with 5nm thickness can make catalyst particles distribute uniformly,which is favorite to the growth of aligned CNTs.The growth behavior and micro-structure of CNTs are strongly dependent on growth temperature.The competition among the decomposition of carbon source,diffusion of carbon atom inside the catalyst and agglomeration of catalyst particles related to the temperature determine the growth of CNTs.The tip growth mode and the morphological changes of catalyst particles in the growth of aligned CNTs were described in detail.

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