用磁控溅射法在载玻片上镀制了难混溶体系Al/Pb金属纳米多层膜,考察了调制波长对Pb膜成膜的影响,借用Philip XL370型扫描电子显微镜研究了成膜质量、表面形貌及膜层断面结构形貌,并采用X射线观测了样品中Al、Pb相的存在形式和膜层结构变化.结果表明,当Pb膜达到一定厚度时,可得到均一、致密的难混溶体系Al/Pb金属纳米多层膜.探讨了膜的形成机理,给出了成核过程模型,并进一步修正了传统成膜机制.
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