Structure and Electrical Characteristics of Zinc Oxide Thin Films Grown on Si (111) by Metal-organic Chemical Vapor Deposition

材料科学技术（英文）, 2013, 29(9): 830-834.

^1, , ^2, , ^3, , ^4, , ^5, , ^6,

1.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

2.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

3.School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

4.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

5.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

6.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

基金项目: This work was financially supported by the National Natural Science Foundation of China(.11175038 and 51102036) the Fundamental Research Funds for the Central Universities(DC110314)

Structure and Electrical Characteristics of Zinc Oxide Thin Films Grown on Si (111) by Metal-organic Chemical Vapor Deposition

Yunfeng Wu ^1, , Dongping Liu ^2, , Naisen Yu ^3, , Yuanda Liu ^4, , Hongwei Liang ^5, , Guotong Du ^6,

1.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

2.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China;School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

3.School of Physics and Materials Engineering, Dalian Nationalities University, Dalian 116600, China

4.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

5.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

6.School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024, China

Keywords： ZnO thin films

参考文献

[1]	K. Nakahara;H. Takasu;P. Fons .Growth of N-doped and Ga+N-codoped ZnO films by radical source molecular beam epitaxy[J].Journal of Crystal Growth,2002(Pt.1):503-508.
[2]	S.C. Hung;P.J. Huang;C.E. Chan;W.Y. Uen;F. Ren;S.J. Pearton;T.N. Yang;C.C. Chiang;S.M. Lan;G.C. Chi .Nanostructured surface morphology of ZnO grown on p-type GaN and Si by metal organic chemical vapor deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2008(5P2):3016-3018.
[3]	J.H. Han;Y.S. No;T.W. Kim;J.Y. Lee;J.Y. Kim;W.K. Choi .Microstructural and surface property variations due to the amorphous region formed by thermal annealing in Al-doped ZnO thin films grown on n-Si (100) substrates[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2010(6):1920.

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