以共沉淀ITO粉制备的陶瓷靶材为溅射靶,采用EDX、XRD、SEM研究了靶材在磁控溅射过程中“结瘤”的化学组分及物相组成,并对不同阶段“结瘤”的微观结构进行表征,探讨了“结瘤”的生长演化过程及形成机理.结果表明:“结瘤”与靶材基体具有相同的化学组成及物相结构,其生长演化分为锥状“结瘤”的形成及生长、锥顶外皮脱落、“结瘤”断裂、断面平滑、诱发新“结瘤”产生5个阶段.溅射过程中的“自溅射”效应使外来杂质颗粒和In2O3分解产生的InO在靶材表面形成的凸起逐渐长大并最终形成“结瘤”.
参考文献
| [1] | Zhang, W.;Zhu, G.;Zhi, L.;Yang, H.;Yang, Z.;Yu, A.;Xu, H. .Structural, electrical and optical properties of indium tin oxide thin films prepared by RF sputtering using different density ceramic targets[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2012(8):1045-1047. |
| [2] | Yuhu Li;Zhihong Liu;Qihou Li .Recovery of indium from used indium-tin oxide (ITO) targets[J].Hydrometallurgy,2011(3/4):207-212. |
| [3] | 聚合物太阳电池ITO电极的光刻制备[J].人工晶体学报,2012(06):1549-1553,1560. |
| [4] | 刘黎明,杨培志,莫镜辉.ITO靶材黑化物的X射线光电子能谱研究[J].光学与光电技术,2009(05):84-86. |
| [5] | Takahisa Omata;Masao Kita;Hideya Okada;Shinya Otsuka-Yao-Matsuo;Naoki Ono;Hiroyuki Ikawa .Characterization of indium-tin oxide sputtering targets showing various densities of nodule formation[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):22-28. |
| [6] | 孔伟华.ITO靶材在磁控溅射过程中的毒化现象[J].无机材料学报,2002(05):1083-1088. |
| [7] | Nadaud N.;Nanot M.;Jove J.;Roisnel T.;Lequeux N. .Structural studies of tin-doped indium oxide (ITO) and In4Sn3O12[J].International Journal of Quantum Chemistry,1998(1):140-148. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%