用大功率(kW级)CO_2激光在金属基材上通过化学气相沉积获得α-Si_3N_4膜。膜层多为细小的Si_3N_4颗粒组成,与基材有良好的结合,具有超硬和优良的耐磨抗蚀等性能,厚度在5—30μm范围内可控。
A superhard α-Si_3N_4 film, deposited on metal substrate, was made by laser chemical vapour deposition adopting a kW-level high power CO_2 laser, Most films are of fine grain Si_3N_4. They join the metal substrate in strong bond. The films have super hardness, excellent resistances to wear and corrosion, etc. Their thickness may be controlled within 5—30μm.
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