目的：研究稳定剂NH4 HF2对铁电结晶过程的影响。方法采用线性电位扫描伏安法、单电位阶跃计时电流法、电化学交流阻抗谱等技术，研究含不同浓度NH4 HF2的镀铁溶液中，铁在玻碳电极上的电沉积行为。结果随着NH4 HF2浓度的增加，铁沉积的阴极极化变小。在-1.225~-1.300 V阶跃电位范围内，铁在玻碳电极上的电结晶都遵循三维瞬时成核理论，稳定剂浓度的变化不会改变其成核机理。随着NH4 HF2浓度的增加，晶核垂直生长速率和双电层电容明显增大，溶液/电极界面电荷传递电阻显著降低，而溶液电阻呈小幅度降低。结论稳定剂NH4 HF2的加入可促进Fe2+的电沉积，并提高晶核的垂直生长速率。
Objective To understand the effect of NH4 HF2 on the cathodic process of iron electrodeposition. Methods Linear sweep voltammetry, single-potential step chronoamperometry and AC impedance spectroscopy were adopted to study the electrocrys-tallization of iron in plating solutions containing different concentrations of NH4 HF2 . Results With the increase in the concentration of NH4 HF2 , the cathodic polarization of iron electrodeposition was decreased;in the Step-potential range of-1. 225~ -1. 300 V, the electrocrystallization of iron on glassy carbon electrode followed 3D instantaneous nucleation regardless of the concentration of NH4 HF2; when the concentration of NH4 HF2 increased, the outward growth rate of crystal nucleus and the double layer capacitance were enhanced, however the charge transfer resistance of solution/cathode interface was obviously decreased and the solution resis-tance was slightly declined. Conclusion The addition of NH4 HF2 could accelerate the electrodeposition of iron and increase the out-ward growth rate of crystal.
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