采用射频磁控溅射方法制备了单层TiAlN、CrAlN复合薄膜以及不同调制周期和不同层厚比(lTiAlN/lCrAlN)的TiAlN/CrAlN纳米结构多层膜.薄膜采用X射线衍射仪、扫描电子显微镜、显微硬度仪进行表征.结果表明:TiAlN、CrAlN复合薄膜和TiAlN/CrAlN多层膜均为面心立方结构,呈(111)面择优取向.TiAlN/CrAlN多层膜的择优取向与调制周期和层厚比无关.层厚比为1的TiAlN/CrAlN多层膜的硬度依赖于调制周期,在调制周期为8 nm时,达到最大;固定TiAlN的厚度为4 nm,改变CrAlN层的厚度,在研究范围内,多层膜的硬度随着CrAlN层厚度的增加而增加.探讨了多层膜的致硬机制.TiAlN/CrAlN多层膜抗氧化温度比其组成单层膜高了近200 ℃,并讨论了其抗氧化机制.
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