采用化学镀工艺在P型（100）单晶硅表面制备了含P约7．31％（原子分数）的Co—P镀层，研究了镀层的显微结构、耐蚀性能和磁性。结果表明：Co-7．31％P镀层为密排六方结构，平均晶粒尺寸为24nm，表面均匀分布着微米级枯叶状团簇，团簇之间存在纳米级孔隙；镀层在10．0％NaOH溶液中耐蚀性最好，3．5％NaCl溶液中次之，1．0％H2SO4溶液中最差；室温下镀层表现出明显的磁各向异性，易磁化方向的饱和磁化强度和矫顽力分别为138．5A·m2／kg和25870．0A／m。
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