简述了化学气相沉积技术(Chemical Vapor Deposition, 简称CVD)的发展历程及其应用领域;重点阐述CVD技术在难熔金属(W、Re、Ta、Mo、Nb)相关领域的应用概况并展望了其研究前景,特别指出CVD技术在制备难熔金属合金研究上存在的挑战和机遇.
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