采用直流磁控溅射和真空退火方法制备β-FeSi2/Si异质结,首先在n型Si（100）衬底上沉积Fe膜,经真空退火形成β-FeSi2/Si异质结,Fe膜厚度约238nm,退火后形成的β-FeSi2薄膜厚度约为720nm。利用XRD、SEM和红外光谱仪分别研究了β-FeSi2薄膜的晶体结构、表面形貌和光学性质。霍尔效应结果表明,制备的β-FeSi2薄膜为n型导电,载流子浓度为9.51×1015cm-3,电子迁移率为380cm2/（V.s）。
Hetero structures of β-FeSi2 /Si were prepared by DC-magnetron sputtering and vacuum annealing.Firstly,Fe film was deposited on n-type Si（100） substrate at room temperature,subsequently annealed in a vacuum furnace to form β-FeSi2/Si hetero structure.The thickness of Fe and β-FeSi2 was 238 and 720nm,respectively.The crystal structure,surface topography and optical properties of the β-FeSi2 film were characterized with X-ray diffraction（XRD）,scanning electron microscope（SEM） and infrared spectrometer.The electricity and transport properties of β-FeSi2 film were measured by Hall effect.The results indicated that β-FeSi2 film with n-type conducting,the electron concentration was 9.51×1015cm-3 and the mobility of electrons was 380cm2 /（V.s）.
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