采用化学刻蚀两步法制备硅纳米线.在制作过程的不同阶段,通过金相显微镜,扫描电子显微镜及透射电子显微镜分别对其表面形态进行观察.结果表明,通过两步法制作的硅纳米线比传统刻蚀方法制作的样品具有更细的直径.光致发光的测量结果表明,两步法制备的硅纳米线在可见光领域有较强的红光发射.
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