PHASE TRANSFORMATION BEHAVIOR IN THE SPUTTERDEPOSITED Ti-Pd-Ni THIN FILMS

金属学报(英文版), 2001, 14(5): 319-322.

^1, , ^2,

1.Key Laboratory of the Ministry of Education for High Temperature Materials and Tests,School of Materials Science and Engineering,Shanghai Jiao Tong University, Shanghai 200030,China.

2.Key Laboratory of the Ministry of Education for High Temperature Materials and Tests,School of Materials Science and Engineering,Shanghai Jiao Tong University, Shanghai 200030,China.

基金项目: 上海市科委资助项目(11JC14055)

PHASE TRANSFORMATION BEHAVIOR IN THE SPUTTERDEPOSITED Ti-Pd-Ni THIN FILMS

Keywords： Ti-Pd-Ni

Ti-Pd-Ni thin films were prepared by sputter deposition at room temperature. The asdeposited thin films were crystallized at 750°C followed by various cooling conditions,and the structural change emerged in the films was characterized by means of both X-ray diffraction (XRD) and differiantial scanning calorimetry (DSC). It was found that the phase transformation temperatures of Ti50.6Pd30Ni19.4 ingot are much higher than those of its thin film. The B19' and B19 phases coexisted, together with the Ti2Ni and Ti2Pd type of precipitates at the room temperature. Both the B19-B2 onestage and the B19'-B19-B2 two-stage phase transformations took place when the films experienced thermal change across the region of phase transformation temperatures.``

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PHASE TRANSFORMATION BEHAVIOR IN THE SPUTTERDEPOSITED Ti-Pd-Ni THIN FILMS

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