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  4. 氧化锌镓薄膜的制备技术和研究现状

材料导报, 2011, 25(7): 17-23.

氧化锌镓薄膜的制备技术和研究现状

王小伟 1, , 李晨辉 2, , 柯文明 3, , 胡加佳 4, , 黄帅 5,

1.华中科技大学材料成形与模具技术国家重点实验室,武汉430074

2.华中科技大学材料成形与模具技术国家重点实验室,武汉430074

3.华中科技大学材料成形与模具技术国家重点实验室,武汉430074

4.华中科技大学材料成形与模具技术国家重点实验室,武汉430074

5.华中科技大学材料成形与模具技术国家重点实验室,武汉430074

基金项目:   国家自然科学基金(50474077)  

关键词： GZO薄膜 , 透明导电氧化物 , 制备方法 , 电阻率 , 可见光透过率

Preparation and Present Studies of Ga Doped Zinc Oxide Thin Films

介绍了制备GZO薄膜的各种方法,如磁控溅射法、化学气相沉积法、溶胶-凝胶法、脉冲激光沉积法、喷雾热解法;阐述了这些方法的镀膜原理,并比较了各种工艺的优缺点.综述了GZO薄膜在单层膜领域、复合多层膜领域有机物基底上镀膜领域和薄膜后续退火处理领域的研究现状.提出了产业化过程中需要解决的问题:①制备高密度、高溅射稳定性和导电性优良的靶材;②完善现有镀膜工艺条件;③制备符合不同生产要求的薄膜..

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