电弧熔炼制备的(Mo0.85Nb0.15)Si2合金为MoSi2(C11b结构)和NbSi2(C40结构)两相组织.以电弧熔炼得到的合金为母合金,通过光学悬浮区域熔炼法,选择适当的生长速度4 mm/h制备了(Mo0.85Nb0.15)Si2单晶,单晶结构为C40结构.对单晶在1 200～1 700℃进行不同时间的退火处理.研究了不同热处理制度对合金显微结构的影响规律.结果表明:经1 600℃,6 h退火处理后,在合金中形成了排列紧密、方向取向相同的全片层状结构,片层间距为200～300 nm.经EDS分析,这种片层结构由贫Nb的C11b相和富Nb的C40相组成.
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