氮化硅陶瓷的液相连接研究

无机材料学报, 1998, 13(3): 427-431.

氮化硅陶瓷的液相连接研究

解荣军 , 黄莉萍 , 陈源 , 符锡仁

中国科学院上海硅酸盐研究所

上海 200050

Shanghai Institute of Ceramics

Chinese Academy of Sciences Shanghai 200050 China

关键词：连接 , silicon nitride , bonding strength

Joining of Silicon Nitride Ceramics by Liquid Phase

XIE Rong-Jun , HUANG Li-Ping , CHEN Yuan , FU Xi-Ren

Keywords： joining , 氮化硅 , 结合强度

本文研究了用氧氮玻璃作为中间层材料连接氮化硅陶瓷．结果表明，在1600℃×30min、5MPa的外加压力条件下，氮化硅陶瓷的结合强度达到基体氮化硅陶瓷的57％．结合层内的结构与基体氨化硅十分相似，但是晶粒尺寸较细，两者结构上的一致性对于提高结合强度起着重要的作用．

The joining of silicon nitride ceramics using oxynitride glass as the interlayer material wasstudied in this paper. The results showed that the bonding strength of joined silicon nitrideceramics was up to 57% of that of the silicon nitride ceramic matrix. The joint zone had the samemicrostructure as the ceramic matrix , but smaller grain size. The similarity in the microstructuretakes a great role in the increase of bonding strength.

参考文献

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[2]	Grange P, Delmon B. In: Grange P, Delmon B, ed. "Interfaces in New Materials" Elsevier Applied Science, 1991. 12--28 2 Dobedoe R S, Holland D. Key Engineer. Mater., 1995, 99&

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