采用纳米恪痕仪研究柚Cu-Au多层膜的硬度、弹性模柎及其在恪头下的变形行为。结果表明,随单层膜厚度(h)的减小,Cu-Au多层膜的弹性模柎略有减小。Cu-Au多层膜的硬度随单层膜厚度的减小而增加,当h≥50 nm时,硬度随1 h线性增加;当h<50 nm时,硬度与1 h偏果柚原来的线性关系,且硬度随1 h的增大而增大的趋势开始弱化。在单层膜厚度为25 nm的Cu-Au多层膜的恪痕附近,出现柚“挤出”和剪切带。
The elastic modulus, hardness and deformation behavior around indent of the Cu-Au multilayer film were investigated by using a nanoindentor. It was found that with decreasing individual layer thickness (h) the elastic modulus exhibited a slight decrease whereas the hardness of the Cu-Au multilayer film increased. In the case of h≥50 nm, the hardness increases linearly with 1h . When h is less than 50 nm, the increase in hardness with 1h deviates from the linear relation and shows a weak depth dependence. In addition, the material pile-up and shear bands around the indent in Cu-Au multiplayer film with individual layer thickness of 25 nm were also observed.
参考文献
[1] | Wood JT.;Embury JD.;Zhou R.;Nastasi M.;Veron M.;Griffin AJ. .THE INFLUENCE OF MICROSTRUCTURAL SCALE ON THE COMBINATION OF STRENGTH AND ELECTRICAL RESISTIVITY IN COPPER BASED COMPOSITES[J].Journal of the Mechanics and Physics of Solids,1996(5):737 ff.-0. |
[2] | Anderson P M;Li C .Hall-Petch relations for multilayered materials[J].Nanostructured Materials,1995,5(3):349-362. |
[3] | Cammarata R C;Schlesinger T E;Kim C et al.Nano-indentation study of the mechanical properties of copper-nickel multilayered thin films[J].Applied Physics Letters,1990,56(19):1862-1864. |
[4] | Bayot D;Degand M;Devillers M .Synthesis and characterization of homo- and heterobimetallic niobium(v) and tantalum(v) peroxo-polyaminocarboxylato complexes and their use as single or multiple molecular precursors for Nb-Ta mixed oxides[J].International Journal of Quantum Chemistry,2005(9):2635-2642. |
[5] | Ruud J A;Jervis T R;Spaepen F .Nanoindentation of Ag/Ni multilayered thin films[J].Journal of Applied Physics,1994,75(10):4969-4974. |
[6] | Amit Misra;Harriet Kung .Deformation behavior of nanostructured metallic multilayers[J].Advanced Engineering Materials,2001(4):217-222. |
[7] | 张海霞,张泰华,郇勇.纳米压痕和划痕法测定氧化硅薄膜材料的力学特性[J].微纳电子技术,2003(07):245-248. |
[8] | Bolshakov A.;Pharr GM. .Influences of pileup on the measurement of mechanical properties by load and depth sensing indentation techniques[J].Journal of Materials Research,1998(4):1049-1058. |
[9] | 张泰华,杨业敏.纳米硬度技术的发展和应用[J].力学进展,2002(03):349-364. |
[10] | H.D. Espinosa;B.C. Prorok;B. Peng .Plasticity size effects in free-standing submicron polycrystalline FCC films subjected to pure tension[J].Journal of the Mechanics and Physics of Solids,2004(3):667-689. |
[11] | Huang H.;Spaepen F. .TENSILE TESTING OF FREE-STANDING Cu, Ag AND Al THIN FILMS AND Ag/Cu MULTILAYERS[J].Acta materialia,2000(12):3261-3269. |
[12] | 束德林.金属力学性能[M].北京:机械工业出版社,1995:15-18. |
[13] | Q. Wei;D. Jia;K. T. Ramesh;E. Ma .Evolution and microstructure of shear bands in nanostructured Fe[J].Applied physics letters,2002(7):1240-1242. |
- 下载量()
- 访问量()
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%