以正硅酸乙酯(TEOS)为硅源,采用溶胶-凝胶技术,通过两步酸法控制实验条件引入有机硅烷甲基三乙氧基硅烷(MTES)和表面活性剂十六烷基三甲基溴化氨(CTAB),制备了疏水型SiO2前驱体溶胶.以旋涂法成膜出SiO2-MTES-CTAB纳米疏水薄膜,研究了正硅酸乙酯与甲基三乙氧基硅烷不同的混合比以及不同的热处理温度等对纳米疏水薄膜的影响,并且分析了纳米疏水薄膜的表面形态.研究表明,利用有机基团甲基三乙氧基硅烷改性SiO2溶胶和薄膜的热处理温度对制备的SiO2基纳米疏水薄膜的性能以及表面形态都具有非常重要的影响.
SiO2-MTES-CTAB nano-composite hydrophobic sols are prepared using tetraethoxysliane(TEOS)as a silica source; addition methyltriethoxysilane (MTES) and cetyltrimetylammonium bromide (CTAB) by two-step acid/acid via a sol-gel process. The precursors are deposited on substrates by spin coating to obtain hydrophobic films.The effects of different molar ratios of MTES and TEOS and different temperatures for heat treatment to the nanofilms are studied, the surface feature is analyzed at the same time. This study indicates that the content of methyltriethoxysilane(MTES) and the temperature of heat treatment have a significant effect to thenature of SiO2-MTES-CTABnano-films.
参考文献
| [1] | 陶丰,郑旭煦.纳米尺度的表面化学在薄膜材料与表面工程中的应用[J].中国表面工程,2007(05):1-10. |
| [2] | 肖克.硅溶胶SiO2粒径对精铸壳型涂料的影响[J].材料工程,2002(06):32-33. |
| [3] | A. Dima;F.G. Delia Corte;C.J. Williams;K.G. Watkins;G. Dearden;N. O'Hare;M. Casalino;I. Rendina;M. Dima .Silicon nano-particles in SiO_2 sol-gel film for nano-crystal memory device applications[J].Microelectronics journal,2008(5):768-770. |
| [4] | Kubeková M;Pospíilová M;Matjec V .Thin films sensitive to pH changes prepared by sol-gel method[J].Journal of Sol-Gel Science and Technology,2004,2:1. |
| [5] | 阮刚,陈智涛,肖夏,朱兆旻,段晓明.ULSI互连中纳米多孔SiO2的制造工艺、特性及应用前景[J].固体电子学研究与进展,2002(03):349-354. |
| [6] | 李靓,姚熹,张良莹.非制冷热释电薄膜红外探测器热绝缘结构的研制[J].半导体学报,2004(07):847-851. |
| [7] | Wu Guangming;Wang Jue;Shen Jun et al.Strengthening mechanism of porous silica films derived by two-step calalysis[J].Journal of Physics D:Applied Physics,2001,34:1301. |
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