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采用传统的轧制和退火工艺制备了0.30mm厚的6.5%(质量分数)Si高硅电工钢薄板,采用X射线衍射技术对退火过程中的再结晶织构进行了研究。冷轧高硅钢薄板700℃退火形成以{111}〈112〉为峰值的γ织构(〈111〉∥ND)和以{001}〈210〉为峰值的{001}织构;而900℃以上温度退火则形成强{001}〈210〉织构。进一步的研究表明是在晶粒长大过程中{001}〈210〉发展成为主要再结晶织构组分。

High silicon steel thin sheets with thickness of 0.3mm were successfully produced by conventional rolling and annealing methods.Recrystallization texture was investigated by means of X-ray diffraction.It is found that recrystallization texture is mainly composed of γ fiber(〈111〉∥ND)with peak at {111}〈112〉 and {001} fiber with peak at {001}〈210〉 after annealing at 700℃,while strong {001}〈210〉 component dominates recrystallization texture after annealing above 900℃.It is during grain growth that {001}〈210〉 is significantly enhanced and finally develops to the main texture component.

参考文献

[1] 杨劲松,谢建新,周成.6.5%Si高硅钢的制备工艺及发展前景[J].功能材料,2003(03):244-246.
[2] Je-Sik Shin;Zin-Hyoung Lee;Taek-Dong Lee .The effect of casting method and heat treating condition on cold workability of high-Si electrical steel[J].Scripta materialia,2001(6):725-731.
[3] Houbaert Y;Ros-Yanez T;Monsalve A;Lorenzo JB .Texture evolution in experimental grades of high-silicon electrical steel[J].Physica, B. Condensed Matter,2006(1/2):310-312.
[4] T. Ros-Yanez;Y. Houbaert;O. Fischer .Production of high silicon steel for electrical applications by thermomechanical processing[J].Journal of Materials Processing Technology,2003(1):132-137.
[5] Jong-Tae PARK;Jerzy A. SZPUNAR .Texture Development during Grain Growth in Nonoriented Electrical Steels[J].ISIJ International,2005(5):743-749.
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