采用循环伏安法合成了一种新的聚合物膜——聚8-羟基喹啉膜,推测了聚合的机理,通过红外光谱分析了聚合膜的组成.采用单因素实验优化了成膜条件,结果表明,循环伏安法形成聚8-羟基喹啉膜的最佳条件是:8-羟基喹啉浓度为0.002 mol/L,氢氧化钠浓度为0.4 mol/L,扫描速度30 mV/s,扫描8圈.采用该成膜条件在镀镍工件上电沉积聚8-羟基喹啉,其表面形成了一层浅黄色明亮光滑的致密薄膜,达到封孔目的,使得工件的耐蚀性显著提高.
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