用高功率直流电弧等离子体喷射方法研究金刚石膜沉积温度稳定性对膜中黑色缺陷产生的影响.结果表明,在温度稳定条件下制备的金刚石膜中,黑色缺陷的密度较低;当沉积温度大幅度变化时,在膜中产生大量黑色缺陷.形成大量黑色缺陷的原因是:沉积温度变化时,在金刚石晶粒的表面形成贯穿型孪晶,而在随后的生长过程中,这些孪晶的长大将抑制金刚石膜局部生长环境中活化的反应气体与其下晶界位置的金刚石组织接触,导致其生长缓慢并保留在金刚石膜中,从而形成大量黑色缺陷.
Diamond film was prepared by DC arc plasma jet method and the effect of change of deposition temperature in the process of deposition on formation of dark feature was investigated.The result indicates that the lower density of dark feature is observed in the diamond film under stable temperature conditions.When the deposition temperature changes significantly, a large number of dark feature is formed.The cause is that penetration twins form when the deposition temperature is changed in the process of diamond film deposition.The pathway between reactive gas and micro-zones of grain boundaries will be blocked when formation of penetration twins on surface of the diamond films, and as a result of this, the dark feature,which is a type of growth defects is produced.
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