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  4. 碳化硼薄膜制备的研究进展

材料导报, 2008, 22(z3): 328-335.

碳化硼薄膜制备的研究进展

范强 1, , 廖志君 2, , 伍登学 3,

1.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

2.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

3.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

基金项目:   国家高技术研究发展计划(863计划)(2007AA804406)  

关键词： 碳化硼 , 薄膜 , 性能 , 制备方法

Research Progress in Fabrication of Boron Carbide Thin Film

FAN Qiang 1, , LIAO Zhijun 2, , WU Dengxue 3,

1.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

2.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

3.四川大学物理系和辐射物理及技术教育部重点实验室,成都,610064

Keywords： boron carbide , thin film , properties , fabrication method

综述了碳化硼材料的主要性能和制备碳化硼薄膜的主要方法,讨论了包括磁控溅射、离子束沉积和化学气相沉积等制备方法的优点及重要工艺参数,并就各方法指出了提高薄膜性能的主要措施,指出制备出更均匀、致密的碳化硼薄膜,提高薄膜与基体间的结合力,降低薄膜应力仍是今后研究的重点.

The major properties of boron carbide and preparation methods of boron carbide thin film are reviewed.The advantages and important deposition parameters of these methods including DC/RF magnetron sputtering,ion beam evaporation and chemical vapor deposition are discussed,and the measures of improving the performances of boron carbide thin film are pointed out.It is evident from this review that intensive research still remains to be done and how to prepare the homogeneous boron carbide thin films with higher density,higher film-substrate adhesion and lower internal stress is the key study in the future.

参考文献

[1] Thevenot F .A renew on boron carbide[J].Key Engineering Materials,1991,56-57:59.
[2] Ridgway R R .Boron carbide:A new crystalline abrasive and wear resisting product[J].Transactions of the Electrochemical Society,1934,66:117.
[3] T.K. Roy;C. Subramanian;A.K. Suri .Pressureless sintering of boron carbide[J].CERAMICS INTERNATIONAL,2006(3):227-233.
[4] Telle R.Structure and properties of ceramics[A].Weinheim:vcH Publishers,1994:173.
[5] Veprek S et al.Development of plasma CVD and feasibility study of boron carbide in-situ coatings for tokamaks[J].Journal of Nuclear Materials,1989,162-164:724.
[6] Ogiwara N;Jimbou R;Saidoh M et al.The reaction of H2O,O2 and energetic O2+ on boron carbide[J].Journal of Nuclear Materials,1994,212-215(02):1260.
[7] Olsson M;Soderberg S;Stridh B et al.Chemical vapour deposition of boron carbides Ⅱ:morphology and microstructure[J].Thin Solid Films,1989,172(01):95.
[8] Byun D;Spady B R;Ianno N J et al.Comparison of different chemical vapor deposition methodologies for the fabrication of heterojunction boron-carbide diodes[J].Nano-Structured Materials,1995,5(04):465.
[9] Ensinger W;Kraft G;Sittner F;Volz K;Baba K;Hatada R .Silicon carbide and boron carbide thin films formed by plasma immersion ion implantation of hydrocarbon gases[J].Surface & Coatings Technology,2007(19/20):8366-8369.
[10] Reigada D C;Prioli R;Jacobsohn L G et al.Boron carbide films deposited by a magnetron sputter-ion plating process:film composition and tribological properties[J].Diamond and Related Materials,2000,9:489.
[11] Csako T;Budai J;Szorenyi T .Property improvement of pulsed laser deposited boron carbide films by pulse shortening[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(13):4707-4711.
[12] Prioli R;Reigada D C;Freire Jr F L .Correlation between nano-scale filction and wear of boron carbide films deposited by dc-magnetron sputtering[J].Applied Physics Letters,1999,75:1317.
[13] Guruzl M U;Dravid V P;Chung Y W .Synthesis and characterization of single and multilayer boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide[J].Thin Solid Films,2002,414(01):129.
[14] Wu M L;Kiely J D;Klemmer T et al.Process-property relationship of boron carbide thin films by magnetron sputtering[J].Thin Solid Films,2004,449:120.
[15] Jacobsohn LG;Schulze RK;da Costa MEHM;Nastasi M .X-ray photoelectron spectroscopy investigation of boron carbide films deposited by sputtering[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2004(2/3):418-424.
[16] Jacobsohn LG;Nastasi M .Sputter-deposited boron carbide films: Structural and mechanical characterization[J].Surface & Coatings Technology,2005(5/6):1472-1475.
[17] Chen Yanfeng;Chung Yip-Wah;Li Shuyou .Boron carbide and boron carbonitride thin films as protective coatings in ultra-high density hard disk drives[J].Surface and Coatings Technology,2006,200:4072.
[18] S. Ulrich;H. Ehrhardt;J. Schwan;R. Samlenski;R. Brenn .Subplantation effect in magnetron sputtered superhard boron carbide thin films[J].Diamond and Related Materials,1998(6):835-838.
[19] Pascual E. .Boron carbide thin films deposited by tuned-substrate RF magnetron sputtering[J].Diamond and Related Materials,1999(2 Mar):402-405.
[20] Lee KE;Kim CO;Park MJ;Kim JH .Preparation of boron carbide thin films from reactive sputtering of boron[J].Physica status solidi, B. Basic research,2004(7):1637-1640.
[21] Zenghu Han;Geyang Li;Jiawan Tian;Mingyuan Gu .Microstructure and mechanical properties of boron carbide thin films[J].Materials Letters,2002(4):899-903.
[22] Lee K E;Lee J Y;Park M J et al.Preparation of boron carbide thin films for HDD protecting layer[J].Journal of Magnetism and Magnetic Materials,2004,272-276:2197.
[23] Yatsui K .Industrial application of pulse power and particle beams[J].Laser and Particle Beams,1989,7:733.
[24] Chen Haiying;Wang Jing;Yang Hai et al.Synthesis of boron carbide films by ion beam sputtering[J].Surface and Coatings Technology,2000,128-129:329.
[25] Suematsu H.;Kitajima K.;Ruiz I.;Kobayashi K.;Takeda M.;Shimbo D. Suzuki T.;Jiang W.;Yatsui K. .Thermoelectric properties of crystallized boron carbide thin films prepared by ion-beam evaporation[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):132-135.
[26] Zhou MJ;Wong SF;Ong CW;Li Q .Microstructure and mechanical properties of B4C films deposited by ion beam sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2007(2/4):336-339.
[27] Syunsuke Sasaki;Masatoshi Takeda;Keisuke Yokoyama;Takahiro Miura;Tsuneo Suzuki;Hisayuki Suematsu;Weihua Jiang;Kiyoshi Yatsui .Thermoelectric properties of boron-carbide thin film and thin film based thermoelectric device fabricated by intense-pulsed ion beam evaporation[J].Science and technology of advanced materials,2005(2):181-184.
[28] Postel O;Heberlein J .Deposition of boron carbide thin film by supersonic plasma jet CVD with secondary discharge[J].Surface and Coatings Technology,1998,108-109:247.
[29] Olivier B. Postel;Joachim V. R. Heberlein .Boron carbide thin film deposition using supersonic plasma jet with substrate biasing[J].Diamond and Related Materials,1999(10):1878-1884.
[30] Kyu-Wang Lee;S. J. Harris .Boron carbide films grown from microwave plasma chemical vapor deposition[J].Diamond and Related Materials,1998(10):1539-1543.
[31] Oliveira JC.;Conde O. .DEPOSITION OF BORON CARBIDE BY LASER CVD - A COMPARISON WITH THERMODYNAMIC PREDICTIONS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):29-37.
[32] Oliveira J C;Paiva P;Oliveira M N et al.Laser-assisted CVD of boron carbide at atmospheric pressure[J].Applied Surface Science,1999,138-139:159.
[33] Conde O;Silvestre A J;Oliveira J C .Influence of carbon content on the crystallographic structure of boron carbide films[J].Surface and Coatings Technology,2000,125:141.
[34] Zeng, Y;Su, KH;Deng, JL;Wang, T;Zeng, QF;Cheng, LF;Zhang, LT .Thermodynamic investigation of the gas-phase reactions in the chemical vapor deposition of boron carbide with BCl3-CH4-H-2 precursors[J].Journal of Molecular Structure. Theochem,2008(1/3):103-116.
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