欢迎登录材料期刊网

材料期刊网

高级检索

对硫酸盐-氯化物电解液体系(含有LGJ复配稳定剂和添加剂)中电沉积因瓦合金箔的工艺进行了研究,讨论了电解液组成、电流密度、温度及pH值等因素对合金箔组成的影响,得到了制备因瓦合金箔的最佳镀液组成及工艺条件.阴阳极面积比为2:1时,通过实验确定镍铁联合阳极面积比为1.8:1.在上述条件下,实验获得组成稳定(Fe 64±2%)和性能优良的合金箔.通过SEM、EDS和XRD对因瓦合金箔的形貌及结构进行测定分析,表明合金箔晶粒细致、尺寸均匀、结构紧密、表面光滑平整、无孔洞和裂纹、晶粒结构为(111)、(200)、(311)及(222)织构,并表现为较强的(111)择优取向.

参考文献

[1] 金属手册·第九版第3卷[M].北京:机械工业出版社,1997:859.
[2] S. D. Leith;S. Ramli .Characterization of NixFe1-x (0.10 < x <0.95) Electrodeposition from a Family of Sulfamate – Chloride Electrolytes[J].Journal of the Electrochemical Society,1999(4):1431-1435.
[3] HiranoToshiki;Fan Longsheng;Gao Jenny Q.NVAR MEMS milliactuator for hard disk application[J].Proceedings of the IEEE Micro Electro Mechanical Systems(MEMS),1997:378.
[4] 陈垚,张轩雄,熊幸果,王渭源.用于微机械器件的Fe-Ni合金电镀沉积膜的性能[J].金属学报,2000(05):525-529.
[5] FukamichiK.Landolt B rnstein Group Ⅲ Condensed Matter (19)[J].Springer VerlagHeidelberg,1994:193.
[6] GrigorievSV;Maleyev S V;Okorokov A I et al.Critial magnetic scattering in invar Fe65 Ni35 alloy[J].Applied Physics A:Materials Science and Processing,2002,74(01):655.
[7] GolergD;Xu F F;Bando Y .Filling boron nitride nanotudes with metals[J].Applied Physics A:Materials Science and Processing,2003,76(04):479.
[8] WendyCGorande;Jan B et al.Electrodeposion of thin films of nickel-iron[J].Journal of the Electrochemical Society,1993,140(03):669.
[9] 邓珠皓 .脉冲电沉积纳米晶铬镍铁合金及其基础理论研究[D].长沙:中南大学,2003.
[10] GrimmettDL;Schwartz M;Nobe K .Electrodepositiono iron-nickel invar alloy[J].Plating and Surface Finishing,1988,6:94.
[11] 赵奇金.电解法制取Ni-Fe合金箔工艺的回归正交设计[J].金属学报,2000(07):723-727.
[12] N. V. Myung;K. Nobe .Electrodeposited Iron Group Thin-Film Alloys Structure-Property Relationships[J].Journal of the Electrochemical Society,2001(3):C136-C144.
[13] 沈春雷;王庆增;冷凤英 .电铸铁和铁合金箔研究[J].材料保护,1990,23(07):12.
[14] Choi;Janghyun;Yim et al.Apparatus and method for manufacturing Ni-Fe alloy thin foil[P].US Pat,6428672,2002-08-06.
[15] Nakamura;Umetani M;Hayashi T .Electrodeposition of iron-rich iron-nickel alloys from sulphate and chloride baths[J].Surface Technology,1985,25(02):111.
[16] PushpavanamM;Karthik R;Raja R J .Effect of addition agents on the electrodeposition of INVAR alloys[J].Transactions of the Institute of Metal Finishing,2003,81(02):68.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%