Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films

材料科学技术（英文）, 2001, 17(1): 39-40.

^1, , ^2, , ^3, , ^4, , ^5, , ^6, , ^7,

1.School of Materials Science and Engineering, Harbin Institute of Technology,

2.School of Materials Science and Engineering, Harbin Institute of Technology,

3.School of Materials Science and Engineering, Harbin Institute of Technology,

4.School of Materials Science and Engineering, Harbin Institute of Technology,

5.School of Materials Science and Engineering, Harbin Institute of Technology,

6.School of Materials Science and Engineering, Harbin Institute of Technology,

7.School of Materials Science and Engineering, Harbin Institute of Technology,

Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films

The effect of annealing temperature on the formation of the PtSi phase, distribution of silicides and the surface morphologies of silicides films is investigated by XPS, AFM. It is shown that the phase sequences of the films change from Pt-Pt2Si-PtSi-Si to Pt+Pt2Si+PtSi-PtSi-Si or Pt+Pt2Si+PtSi-PtSi-Si with an increase of annealing temperature and the reason for the formation of mixed layers is discussed.

参考文献

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[2]	E P Domashevskaya;Yu A Yurakov;V M Kashkarov .[J].Thin Solid Films,1997,298:135.
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[4]	J.M.Poate;K.N.Tu;J.W.Mayer.Thin Films: Interdiffusion and Reactio[M].Wiley-Interscience New York,1978
[5]	H Mutaand;D Shinoda .[J].Journal of Applied Physics,1972,43:2913.

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Effect of Annealing Temperature on the Formation of Silicides and the Surface Morphologies of PtSi Films

参考文献