利用1H MAS NMR技术,在甲烷部分氧化(POM)制合成气反应条件下研究了Rh/SiO2催化剂上氢与金属的相互作用及反应机理. 结果发现,氢气在Rh/SiO2上解离吸附后可能有四种存在形式: 化学位移为δ=-100~-120的可逆(αM)和不可逆(αI)吸附氢物种,δ=0~-100的"氢云"或"氢雾"形式的氢物种和δ=3.0的溢流氢物种. 溢流氢物种是由可逆吸附的氢物种和"氢云"或"氢雾"状态的氢物种溢流到SiO2上并弱吸附在桥式氧(Si-O-Si)附近而形成的. 溢流氢物种活化晶格氧,形成一种POM反应的活性氧物种OH-. 活性氧物种OH-反溢流到Rh上,并与CH4解离吸附在Rh上的CHx物种反应生成含氧中间物种CHxO. CHxO物种的化学位移为5~7. O2参与CHxO物种的进一步氧化,或补充溢流氢夺取桥式氧后形成的缺陷位上的晶格氧,在高温(973 K)反应条件下,O2可能优先补充缺陷位上的晶格氧,使CHx的氧化按表面反应机理进行.
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