随着新工艺和新技术的不断出现,涂层方法越来越多,膜的种类也层出不穷.氮化钛薄膜因具有许多优良的性能而得到了广泛的应用.介绍了几种制备氮化钛硬质薄膜的新方法、形成机理以及其优缺点,并展望了今后的涂层方法的发展.
参考文献
| [1] | 张津,李军,李春天,桑雪梅.金属摩擦表面耐磨自修复技术的研究[J].表面技术,2004(05):7-8. |
| [2] | 吴大维.硬质薄膜材料的最新发展及应用[J].真空,2003(06):1-5. |
| [3] | 张阁,周香林,张济山.高耐磨耐蚀合金涂层相关研究进展[J].材料导报,2005(z1):356-359. |
| [4] | 刘元富,张谷令,王久丽,刘赤子,杨思泽.脉冲高能量密度等离子体法制备TiN薄膜及其摩擦磨损性能研究[J].物理学报,2004(02):503-507. |
| [5] | 张谷令,王久丽,杨武保,范松华,刘赤子,杨思泽.内表面栅极等离子体源离子注入TiN薄膜及其特性研究[J].物理学报,2003(09):2213-2218. |
| [6] | 焦文强,肖国珍,黄春良.氮分压对离子镀氮化钛涂层的影响[J].稀有金属材料与工程,1994(05):61-64. |
| [7] | Han J G;Yoon J S;Kim H J.High temperature wear resistance of (TiAl)N films synthesized by cathodic arc plasma deposition[J].SURFACE AND COATINGS TECHNOLOGY,1996(86-87):82. |
| [8] | Schonjahn C;Bamford M;Donohue L A et al.The interface between TiAlN hard coatings and steel substrates generated by high energetic Cr+ bombardment[J].Surface and Coatings Technology,2000,125(1-3):66. |
| [9] | Stoiber M.;Mitterer C.;Lugmair C.;Panzenbock M. .Fatigue properties of Ti-based hard coatings deposited onto tool steels[J].Surface & Coatings Technology,2001(0):117-124. |
| [10] | Motte P.TiN-CVD process optimization for integration with Cu-CVD[J].MICROELECTRONIC ENGINEERING,2000(50):369. |
| [11] | Jimenez C;Gilles S;Bernard C.Deposition of TiN thin films by organometallic chemical chemical vapor deposition:thermodynamical predictions and experimental results[J].SURFACE AND COATINGS TECHNOLOGY,1995(76-77):237. |
| [12] | 张通和,吴瑜光.离子束技术在工业中的应用[J].机械工人(热加工),2004(07):9-13. |
| [13] | T. Valente;F. P. Galliano .Corrosion resistance properties of reactive plasma-sprayed titanium composite coatings[J].Surface & Coatings Technology,2000(1):86-92. |
| [14] | 冯文然,阎殿然,何继宁,陈光良,顾伟超,张谷令,刘赤子,杨思泽.反应等离子喷涂纳米TiN涂层的显微硬度及微观结构研究[J].物理学报,2005(05):2399-2402. |
| [15] | 解正国;石铭德;庄谨 .空心阴极放电离子镀法沉积氮化钛涂层[J].清华大学学报(自然科学版),1995,35(02):103. |
| [16] | 杨武保,范松华,刘赤子,张谷令,王久丽,杨思泽.脉冲高能量密度等离子体法类金刚石膜的制备及分析[J].物理学报,2003(01):140-144. |
| [17] | Liu B;Chen HF;Jiang BY;Ren YF;Yang S-Z;Zhang JZ .Investigation of titanium coating on Si sub 3 N sub 4 by using a pulsed high energy density plasma (PHEDP) gun[J].Materials Chemistry and Physics,1999(3):219-223. |
| [18] | 刘元富,张谷令,王久丽,刘赤子,杨思泽.脉冲高能量密度等离子体法制备TiN薄膜及其摩擦磨损性能研究[J].物理学报,2004(02):503-507. |
| [19] | 吴成.脉冲送气等离子体枪的实验[J].核聚变与等离子体物理,1989(03):178. |
| [20] | 闫鹏勋;杨思泽;李兵 等.用高能量密度等离子体在室温下制备氮化钛薄膜[J].科学通报,1994,39(17):1547. |
| [21] | Yan P X;Yang S Z;Li B et al.A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma[J].Nuclear Instruments and Material in Physics Research,1995,95:55. |
| [22] | 梁忠友.热等静压技术在特种陶瓷制备中的应用[J].陶瓷,1999(01):39. |
| [23] | William Sproul.PVD Today[J].Cutting Tool Eng,1995(03):44. |
| [24] | Zackrisson J;Rolander U;Weinl G.Microstructure of the surface zone in a heat-treated cermet material[J].Iht J Refr Met Hard Mater,1998(16):315. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%