贵金属纳米粒子催化性能的研究已成为当前新材料及能源科学研究领域的热点之一.最近,在用贵金属粒子作为催化剂,辅助刻蚀硅衬底制作太阳能电池减反射层方面开展了大量的研究工作.综述了近年来贵金属粒子催化刻蚀硅制备减反射层的研究进展,分析了贵金属粒子的催化机理和减反射层制作的影响因素,展望了贵金属粒子催化刻蚀薄膜太阳能电池硅衬底研究的发展趋势.
参考文献
| [1] | Hashmi A S K .[J].Gold Bulletin,2004,37(1-2):51-65. |
| [2] | Kim T S;Stiehl J D;Reeves C T et al.[J].Journal of the American Chemical Society,2003,125(08):2018-2019. |
| [3] | Xu C X;Su J X;Xu X H et al.[J].Journal of the American Chemical Society,2007,129(01):42-43. |
| [4] | X. Li;P. W. Bohn .Metal-assisted chemical etching in HF/H_(2)O_(2) produces porous silicon[J].Applied physics letters,2000(16):2572-2574. |
| [5] | Tsujino K;Matsumura M;Nishimoto Y .Texturization of multicrystalline silicon wafers for solar cells by chemical treatment using metallic catalyst[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2006(1):100-110. |
| [6] | Yae S;Kawamoto Y;Tanaka H et al.[J].Electrochemistry Communications,2003,5:632-636. |
| [7] | Yae S;Tanaka H;Kobayashi T et al.[J].Physics Status Solidi (c),2005,2(09):3476-3480. |
| [8] | Yae S;Kobayashi T;Kawagishi T et al.[J].Journal of Solar Energy Engineering,2006,80:701-706. |
| [9] | Koynov S;Brandt M S;Stutzmann M .[J].Applied Physics Letters,2006,88(20):203107-2031-3. |
| [10] | Nishioka K;Horita S;Ohdaira K;Matsumura H .Antireflection subwavelength structure of silicon surface formed by wet process using catalysis of single nano-sized gold particle[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2008(8):919-922. |
| [11] | Haase C;Stiebig H .[J].Proceedings of Spie,2006,6197:619705-619719. |
| [12] | Kanamori Y;Sasaki M;Hane K .[J].Optics Letters,1999,24(20):1422-1424. |
| [13] | Huang YF;lea Y J;ChenK H et al.[J].Proceedings of Spie,2008,7039:70390W-7031-8. |
| [14] | Boden S A;Bagnall D M .[J].Applied Physics Letters,2008,93(13):133108-1331-3. |
| [15] | Sai H;Kanamori Y;Arafune K et al.[J].Progress in Photovoltaics: Research and Applications,2007,15(05):415-423. |
| [16] | VerlaanlV;WerflC H M van;Houweling Z S .[J].Progress in Photovoltaics: Research and Applications,2007,15(07):563-573. |
| [17] | Xi JQ;Schubert MF;Kim JK;Schubert EF;Chen MF;Lin SY;Liu W;Smart JA .Optical thin-film materials with low refractive index for broadband elimination of Fresnel reflection[J].Nature photonics,2007(3):176-179. |
| [18] | Mei-Ling Kuo;David J. Poxson;Yong Sung Kim;Frank W. Mont;Jong Kyu Kim;E. Fred Schubert;Shawn-Yu Lin .Realization of a near-perfect antireflection coating for silicon solar energy utilization[J].Optics Letters,2008(21):2527-2529. |
| [19] | Macdonald D H;Cuevas A;Kerr M J et al.[J].Journal of Solar Energy Engineering,2004,76:277-283. |
| [20] | Xu C X;Xu X H;Su J X et al.[J].Journal of Catalysis,2007,252:243-248. |
| [21] | Bamwenda G R;Tsubota S;Nakamura T et al.[J].Catalysis Letters,1997,44:83-87. |
| [22] | Kolasinski K W .[J].Current Opinion in Solid State and Materials Science,2005,9:73-83. |
| [23] | Soma Chattopadhyay;Xiuling Li;Paul W. Bohn .In-plane control of morphology and tunable photoluminescence in porous silicon produced by metal-assisted electroless chemical etching[J].Journal of Applied Physics,2002(9):6134-6140. |
| [24] | RubyDS;ZaidiSH .[P].US Patent No.6,329,296,2001. |
| [25] | Koynov S;Brandt M S;Stutzmann M .[J].Physica Status Solidi:Rapid Research Letters,2007,1(02):R53-R55. |
| [26] | Kawakami K;Fujii T;Yae S et al.[J].Journal of Physical Chemistry B,1997,101(23):4508-4513. |
| [27] | 耿学文;李美成.[J].红外与激光工程,2010 |
| [28] | Takabayashi S;Ohashi M;Mashima K;Liu Y;Yamazaki S;Nakato Y .Surface structures, photovoltages, and stability of n-Si(111) electrodes surface modified with metal nanodots and various organic groups[J].Langmuir: The ACS Journal of Surfaces and Colloids,2005(19):8832-8838. |
| [29] | Marnix V.ten Kortenaar;Jeroen J.M.de Goeij;Zovonimr I.Kolar;Gert Frens;Pieter J.Lusse;Marc.R.Zuiddam;Emile van der Drift .Electroless Silver Deposition in 100 nm Silicon Structures[J].Journal of the Electrochemical Society,2001(1):C28-C33. |
| [30] | Peng KQ;Fang H;Hu JJ;Wu Y;Zhu J;Yan YJ;Lee S .Metal-particle-induced, highly localized site-specific etching of Si and formation of single-crystalline Si nanowires in aqueous fluoride solution[J].Chemistry: A European journal,2006(30):7942-7947. |
| [31] | Rao CNR.;Thomas PJ.;Edwards PP.;Kulkarni GU. .Metal nanoparticles and their assemblies [Review][J].Chemical Society Reviews,2000(1):27-35. |
| [32] | Qi, DAP;Lu, N;Xu, HB;Yang, BJ;Huang, CY;Xu, MJ;Gao, LG;Wang, ZX;Chi, LF .Simple Approach to Wafer-Scale Self-Cleaning Antireflective Silicon Surfaces[J].Langmuir: The ACS Journal of Surfaces and Colloids,2009(14):7769-7772. |
| [33] | Min W L;Jiang P;Jiang B .[J].Nanotechnology,2008,19(47):475604-4751-7. |
| [34] | Kazuya Tsujino;Michio Matsumura .Boring Deep Cylindrical Nanoholes in Silicon Using Silver Nanoparticles as a Catalyst[J].Advanced Materials,2005(8):1045-1047. |
| [35] | Tsujino K;Matsumura M .[J].Electrochimica Acta,2007,53:28-34. |
| [36] | [OL].http://www,pv.unsw.edu.au/future-students/postgraduate/area_interest,asp |
| [37] | Oskam G;Long J G;Natarajan A et al.[J].Journal of Physica:Applied Physics,1998,31(16):1927-1949. |
| [38] | Oskam G.;Searson PC. .Electrochemical nucleation and growth of gold on silicon[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2000(1/2):103-111. |
| [39] | Kawamura YL;Sakka T;Ogata YH .Photoassisted control of Pt electrodeposition on p-type Si[J].Journal of the Electrochemical Society,2005(10):C701-C705. |
| [40] | Sai H;Fujii H;Arafune K et al.[J].Applied Physics Letters,2006,88(20):201116-2011-3. |
| [41] | Sai H;Fujii H;Arafune K et al.[J].Japanese Journal Applied Physics,2007,46(6A):3333-3336. |
| [42] | Tsujino K;Matsumura M .[J].Solar Energy Materials and Solar Cells,2006,90:1527-1532. |
| [43] | 耿学文,李美成,赵连城.薄膜太阳能电池硅衬底陷光结构的研究进展[J].功能材料,2010(05):751-754. |
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