Ti1-xAlxN涂层LPCVD过程模拟中的热力学计算

硬质合金, 2013, 30(6): 297-301. doi: 10.3969/j.issn.1003-7292.2013.12.001

Ti1-xAlxN涂层LPCVD过程模拟中的热力学计算

王少卿 ^1, , 陈响明 ^2, , 杜勇 ^3, , 王社权 ^4,

1.中南大学粉末冶金国家重点实验室,湖南长沙410083

2.株洲钻石切削刀具股份有限公司,湖南株洲412007

3.中南大学粉末冶金国家重点实验室,湖南长沙410083

4.株洲钻石切削刀具股份有限公司,湖南株洲412007

基金项目: 湖南株洲钻石切削刀具股份有限公司联合项目、国家教委博士点基金项目(20120162110051)

关键词： CVD , Ti1-xAlxN涂层 , 热力学计算

Application of Thermodynamic Calculation to the Simulation of LPCVD Process of Ti1-xAlxN Coating

Wang Shaoqing ^1, , Chen Xiangming ^2, , Du Yong ^3, , Wang Shequan ^4,

1.中南大学粉末冶金国家重点实验室,湖南长沙410083

2.株洲钻石切削刀具股份有限公司,湖南株洲412007

3.中南大学粉末冶金国家重点实验室,湖南长沙410083

4.株洲钻石切削刀具股份有限公司,湖南株洲412007

Keywords： CVD , Ti1-xAlxN coating , thermodynamic calculation

本文通过Thermo-Calc相图热力学计算软件建立了包含亚稳Fcc-Ti1-xAlxN相的Ti-Al-N三元体系的热力学模型,并对Ti1-xAlxN涂层的LPCVD (Low Pressure Chemical Vapor Deposition)过程进行了计算模拟.研究了AlCl3,NH3和H2等反应气体成分变化对涂层中的Al含量的影响,理论预测结果与文献报道的实验结果吻合良好.利用计算模拟手段探究了富Al-Ti1-xAlxN涂层的沉积过程,并预测了富Al-Ti1-xAlxN涂层中的Al含量随反应气体成分以及沉积温度改变的变化情况.发现适当增加AlCl3、NH3/H2值及沉积温度均可提高涂层中的Al含量.

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