通过单槽法成功制备出了Zn-Ni多层膜，利用扫描电镜SEM观察zn-Ni多层膜的截面微观形貌，同时通过随机配带的x射线成分分析仪对镀层的镍含量做了分析；研究了平均电流、占空比、调制波长对多层膜硬度的影响。结果表明：峰值电流对多层膜中Ni的含量影响很大，峰值电流高时，Ni含量高；多层膜硬度也随峰值电流的增大而增大。
参考文献
| [1] | Tench D M;White J T .Considerations in electrodeposition of eompositionaly modulated alloys[J].Journal of the Electrochemical Society,1990,137(10):3061-3066. |
| [2] | 王辉;祝向荣 .不同制备条件下的Co/Cu多层膜的巨磁阻及铁磁共振研究[J].功能材料与器件学报,1999,5(01):7l一75. |
| [3] | Menezs S;Anderson D P .Wavelength-property correlation in electrodeposited uhrastructured Cu - Ni mutilayers[J].Journal of the Electrochemical Society,1990,137(02):440-444. |
| [4] | Oberle R R;Cammarata R C .Dependence of handness on modulation amplitude in electrodeposited Cu- Ni composi- tionaUy modulated thin films[J].Scripta Materialia,1995,32(04):583-588. |
| [5] | Qu NS.;Zhu D.;Chan KC.;Lei WN. .Pulse electrodeposition of nanocrystalline nickel using ultra narrow pulse width and high peak current density[J].Surface & Coatings Technology,2003(2/3):123-128. |
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