采用直流磁控溅射在表面氧化的Si (001)基片上制备了FePt/C纳米薄膜,将薄膜样品经过600℃真空退火处理1h获得L10-FePt薄膜.用X射线衍射仪(XRD)、振动样品磁强计(VSM)和扫描探针显微镜(SPM)对样品的结构、磁性和表面形貌进行测量和分析.结果表明:随着C底层厚度的增加,L10-FePt薄膜(001)取向度增强,有序化程度提高,矫顽力增大；C溅射时间为180s时,获得了具有(001)织构生长的L10-FePt薄膜.
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