ZnO:Al(ZAO)是一种N型半导体薄膜材料,具有优良的光电特性,如低的电阻率和高的可见光透过率.本文利用射频磁控溅射技术在无机玻璃衬底上制备了ZAO透明导电薄膜,研究了工艺参数对其结构和光电特性的影响.结果表明原位制备的薄膜经热处理后具有c轴择优取向的六角纤锌矿结构,晶粒垂直于衬底方向柱状生长.薄膜的最小电阻率和可见光透过率分别为8.7×10-4Ωcm和85%以上.
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