硅基陶瓷材料高温氧化理论的回顾

材料科学与工程学报, 2002, 20(2): 268-272. doi: 10.3969/j.issn.1673-2812.2002.02.033

硅基陶瓷材料高温氧化理论的回顾

林仕伟 ^1, , 司文捷 ^2, , 彭志坚 ^3, , 苗赫濯 ^4,

1.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

2.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

3.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

4.清华大学新型陶瓷与精细工艺国家重点实验室,北京,100084

关键词：高温氧化 , 硅基材料 , Si , SiC , Si3N4

Review of the Research on the Oxidation Theory of Silicon-based Materials at Ultrahigh Temperature

本文综述了硅基陶瓷材料高温氧化理论,在热动力学和整体控速过程两方面具体介绍了在高温条件下Si、SiC、Si3N4等非氧化物硅基陶瓷的氧化性质的研究进展.

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