采用反应磁控溅射技术在取向硅钢片表面制备了氮化硅(Si3N4)张力涂层.通过实验研究反应磁控溅射时间、高温退火温度和实验气氛对硅钢铁损以及涂层附着性的影响.研究表明,反应磁控溅射技术在硅钢表面溅射氮化硅张力涂层可有效的降低硅钢的铁损,且各种工艺条件对硅钢的铁损和涂层的附着性影响很大.在氮气和氩气气氛中,经过5min反应磁控溅射氮化硅,然后在氢气和氮气的气氛中,820℃下进行高温退火时,取向硅钢的铁损可降低18%.
参考文献
[1] | 王良芳.我国电工钢生产现状及发展建议[J].中国冶金,2004(07):16-22. |
[2] | 张译中.国外晶粒取向硅钢技术的进展[J].上海金属,2002(03):31-38. |
[3] | 储双杰;瞿标 等.硅钢绝缘涂层的研究进展[J].材料科学与工程,1998,16(03):49-54. |
[4] | 卢凤喜.我国2003年及2004年一季度(按国别)进口硅钢数量[J].中国冶金,2004(07):46. |
[5] | 张译中,朱文英.冷轧晶粒取向硅钢的生产及市场动态分析[J].上海金属,2002(06):28-31. |
[6] | 赵键,肖福明,张辉宁.绝缘涂层对高磁感取向硅钢片性能的影响[J].变压器,2002(05):25-27. |
[7] | Yoshiyuki Ushigami;Masato Mizokami;Masahiro Fujikura .Recent development of low-loss grain-oriented silicon steel[J].Journal of Magnetism and Magnetic Materials,2003(0):307-314. |
[8] | 余京松,马青松,葛曼珍,杨辉,江仲华.氮化硅薄膜的制备技术[J].中国陶瓷工业,1999(01):20-22. |
[9] | Brown W D .Proc,Effects of rapid thermal annealing on the properties of plasma-enhanced chemically vapor-deposited silicon nitride[J].Thin Solid Films,1990,186(01):73-85. |
[10] | Matsuzaki K;Hirabayashi A;Saga M J .Characterization of reactively sputter silicon steel[J].Journal of the Electrochemical Society,1992,139:3259. |
[11] | Serikawa T;Okamoto A J .Properties of magnetron-sputtered silicon nitride films[J].Journal of the Electrochemical Society,1984,131:2928. |
[12] | Banerjee R;Bandyopadhyay A K;Rath J K et al.Properties of hydrogenated amorphous Si-N films prepared by r.f.magnetron sputtering with emphasis on the non-stoichiometric region[J].Thin Solid Films,1990,192:259-307. |
[13] | Bandyopadhyay A K;Bhattacharyya T K;Banerjee R et al.Study of hydrogenated amorphous silicon nitride films prepared by RF magnetron sputtering[J].Applied Physics A:Materials Science and Processing,1991,52:339-343. |
[14] | Stedile F C;Baumvol I J R;Schreiner W H et al.Study on direct current reactive sputtering deposition of aluminum nitride thin films[J].Science & Technology A,1992,10:462. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%