采用RF反应溅射法在Si(111)衬底上制备出了沿C轴高度取向的多晶ZnO薄膜.通过对ZnO薄膜的X射线衍射(XRD)分析,研究了沉积温度及退火对多晶ZnO薄膜取向性、晶粒大小和应力的影响.结果表明,衬底温度和退火温度对多晶ZnO薄膜的晶体结构影响显著.适当的提高衬底温度或适当的增加退火温度都能有效地改善ZnO薄膜的结构特性,但增加退火温度更有优势.同时原子力显微镜观察表明,退火能有效地降低ZnO薄膜的表面粗糙程度.
参考文献
| [1] | 李剑锋,姚连增,蔡维理,牟季美.氮化硼包覆纳米氧化锌体系的 光致发光特性研究[J].物理学报,2001(08):1623-1626. |
| [2] | Zhnng D H;Yang T L et al.Prepartion of transparent conducting ZnO:Al films on polymer substrates by r.f.magnetron sputtering[J].Applied Surface Science,2000,158:43-48. |
| [3] | Yamamoto T et al.Characterization of ZnO piezoelectric films prepared by rf planar-magnetron sputtering[J].Journal of Applied Physics,1980,51:3113-3120. |
| [4] | Carlotti G;Socino G .Acoustic investigation of the elastic properties of ZnO films[J].Applied Physics Letters,1987,51(23):1889-1891. |
| [5] | Koike J;Shimoe K;Ieki H .1.5GHz low-loss surface acoustic wave filter using ZnO/sapphire substrate[J].Japanese Journal of Applied Physics,1993,32(5B):2337-2340. |
| [6] | Fang Zebo;Wang Yinyue;Peng Xinping et al.Structural and optical properties of ZnO films grown on the AAO templates[J].Materials Letters,2003,57(09):4187-4191. |
| [7] | Hong RJ.;Jiang X.;Szyszka B.;Sittinger V.;Pflug A. .Studies on ZnO : Al thin films deposited by in-line reactive mid-frequency magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(1/4):341-350. |
| [8] | 方泽波,龚恒翔,刘雪芹,徐大印,黄春明,王印月.退火对多晶ZnO薄膜结构与发光特性的影响[J].物理学报,2003(07):1748-1751. |
| [9] | Major S;Banerjee A;Chopra K L .Highly transparent and conducting indium-doped zinc oxide films by spray pyrolysis[J].THIN SOLID FILMS,1983,108:333-340. |
| [10] | Hang H B et al.Single-crystalline ZnO films grown on (0001) Al2O3 substrate by electron cyclotron resonance-assisted molecular beam epitaxy technique[J].Jpn J Appl,1997,2(36-7B):933-935. |
| [11] | Gupta V.;Mansingh A. .INFLUENCE OF POSTDEPOSITION ANNEALING ON THE STRUCTURAL AND OPTICAL PROPERTIES OF SPUTTERED ZINC OXIDE FILM[J].Journal of Applied Physics,1996(2):1063-1073. |
| [12] | Won Taeg Lim;Chang Hyo Lee .Highly oriented ZnO thin films deposited on Ru/Si substrates[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(12):12-15. |
| [13] | 孙贤开,林碧霞,朱俊杰,张杨,傅竹西.LP-MOCVD异质外延ZnO薄膜中的应力及对缺陷的影响[J].物理学报,2005(06):2899-2903. |
| [14] | Reeber R .Lattice parameters of No from 4.2 to 296 k[J].Journal of Applied Physics,1970,41(12):5063-5066. |
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